发明名称 |
Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate |
摘要 |
A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
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申请公布号 |
US7849711(B2) |
申请公布日期 |
2010.12.14 |
申请号 |
US20090512436 |
申请日期 |
2009.07.30 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MAIDA SHIGERU;YAMADA MOTOYUKI |
分类号 |
C03B8/04;C03B19/06;C03B20/00;C03C3/06;C03C3/076;G03F1/24;G03F1/68 |
主分类号 |
C03B8/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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