MANUFACTURING METHOD OF SI FILM USING SI SOLUTION PROCESS

摘要

PURPOSE: A silicon film manufacturing method is provided to improve the utilization of a silicon film by controlling the thickness range of the silicon film according to a purpose. CONSTITUTION: A solution for the formation of silicon is manufactured. A UV is irradiated to the solution. The solution for the formation of silicon is spread onto a substrate. A solvent within the solution for the formation of silicon is removed. An electron beam is irradiated.