FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION, TOPCOAT COMPOSITION, AND METHOD FOR FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition that forms a pattern by using a high energy beam or electron beam having a wavelength of 300 nm or less, and to provide a resin that is used for a topcoat composition in immersion lithography and has water repellency, especially a large receding contact angle.

SOLUTION: There is provided a fluorine-containing polymer of a mass average molecular weight of 1,000-1,000,000 having a repeating unit (a) represented by general formula (2), (wherein R1indicates a group containing a polymerizable double bond; R2indicates a fluorine atom or a fluorine-containing alkyl group; R8indicates a substituted or unsubstituted alkyl group or the like; and W1indicates a single bond, an unsubstituted or substituted methylene group or the like).

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