NANO IMPRINT MOLD AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a nano imprint mold capable of forming minute patterns with high accuracy, and to provide a pattern forming method using this nano imprint mold. SOLUTION: The nano imprint mold (1) is configured to have a transparent base material (2) having a thickness of≤4 mm, a rugged pattern (3) formed on the front surface (2a) side of this base material, and an anti-reflection section (4). The anti-reflection section (4) is situated at least in a part of the region on the back surface (2b) side of the base material (2) or at least in a part of the region of the inside of the base material (2). COPYRIGHT: (C)2011,JPO&INPIT