PROCESSING METHOD AND STORAGE MEDIUM

摘要

PURPOSE: A processing method and a memory medium are provided to sufficiently secure gas for recovering a low dielectric layer. CONSTITUTION: A processing device(1) includes a chamber(11) which receives a wafer(W). A loader(12) for horizontally supporting the wafer is installed inside the chamber. The loader is supported by a cylindrical supporting member which is extended from the bottom center to the upper side of the chamber. A resistance heating type heater(15) is buried in the loader.