发明名称 SEMICONDUCTOR SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor substrate processing device that prevents a processing defect of a semiconductor device by speedily grasping abnormality of an operation state of a lift pin and is surely improved in yield of products by greatly reducing manufacture loss of the semiconductor device. SOLUTION: The semiconductor substrate processing device has a function 1 of always monitoring the load on a motor 11 driving the lift pin 2 and a function 2 of regarding the operation of the lift pin 2 as abnormality when variance in voltage value of the function 1 exceeds a standard value, and allows the elevation state of the lift pin 2 to be speedily grasped by speedily grasping the load on the motor 11 driving the lift pin 2. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010278271(A) 申请公布日期 2010.12.09
申请号 JP20090129741 申请日期 2009.05.29
申请人 PANASONIC CORP 发明人 MIYASAKA KOTARO;NIHODA MAKOTO;HIKISHIMA SHINYA
分类号 H01L21/683 主分类号 H01L21/683
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