发明名称 |
STRAIN MATCHING OF CRYSTALS AND HORIZONTALLY-SPACED MONOCHROMATOR AND ANALYZER CRYSTAL ARRAYS IN DIFFRACTION ENHANCED IMAGING SYSTEMS AND RELATED METHODS |
摘要 |
Strain matching of crystals and horizontally-spaced monochromator and analyzer crystal arrays in diffraction enhanced imaging systems and related methods are disclosed. A DEI system, including strain matched crystals can comprise an X--ray source configured to generate a first X-ray beam. A first monochromator crystal can be positioned to intercept the first X-ray beam for producing a second X-ray beam. A second monochromator crystal can be positioned to intercept the second X-ray beam to produce a third X-ray beam for transmission through an object. The second monochromator crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the second monochromator crystal. An analyzer crystal has a thickness selected such that a mechanical strain on a side of the first monochromator crystal is the same as a mechanical strain on the analyzer crystal.
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申请公布号 |
CA2763367(A1) |
申请公布日期 |
2010.12.09 |
申请号 |
CA20102763367 |
申请日期 |
2010.06.03 |
申请人 |
NEXTRAY, INC. |
发明人 |
CONNOR, DEAN;ZHONG, ZHONG;PARHAM, CHRISTOPHER;PISANO, ETTA |
分类号 |
G21K1/06 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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