发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD OF ILLUMINATION UNIFORMITY CORRECTION AND UNIFORMITY DRIFT COMPENSATION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a uniformity collection system. <P>SOLUTION: A system finger is movably configured so that it can be moved to the inside or outside of the intersection with a radiation beam to correct the intensity of respective parts of the radiation beam. The system includes a working device that is configured to be combined with a corresponding finger in the fingers to move the corresponding finger. The width of the tip of each finger is about a half of that of the working device. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2010278443(A) |
申请公布日期 |
2010.12.09 |
申请号 |
JP20100122493 |
申请日期 |
2010.05.28 |
申请人 |
ASML HOLDING NV;ASML NETHERLANDS BV |
发明人 |
ZIMMERMAN RICHARD CARL;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;KOCHERSPERGER PETER C;DOWNEY TODD R;STONE ELIZABETH;CSISZAR SZILARD ISTVAN;KUBICK FREDERICK;VLADIMIRSKY OLGA |
分类号 |
H01L21/027;G02B19/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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