发明名称 LITHOGRAPHIC APPARATUS AND METHOD OF ILLUMINATION UNIFORMITY CORRECTION AND UNIFORMITY DRIFT COMPENSATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a uniformity collection system. <P>SOLUTION: A system finger is movably configured so that it can be moved to the inside or outside of the intersection with a radiation beam to correct the intensity of respective parts of the radiation beam. The system includes a working device that is configured to be combined with a corresponding finger in the fingers to move the corresponding finger. The width of the tip of each finger is about a half of that of the working device. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010278443(A) 申请公布日期 2010.12.09
申请号 JP20100122493 申请日期 2010.05.28
申请人 ASML HOLDING NV;ASML NETHERLANDS BV 发明人 ZIMMERMAN RICHARD CARL;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;KOCHERSPERGER PETER C;DOWNEY TODD R;STONE ELIZABETH;CSISZAR SZILARD ISTVAN;KUBICK FREDERICK;VLADIMIRSKY OLGA
分类号 H01L21/027;G02B19/00 主分类号 H01L21/027
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