CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGED PARTICLE BEAM DEVICE

摘要

A charged particle beam device has a problem that charged particle beams deflect due to a disturbance in the symmetry of equipotential distribution in the vicinity of the outer peripheral edge of a sample to be evaluated. Electrode plates disposed in the interior of an electrostatic-adsorption sample holding mechanism comprise an inner electrode plate and an outer electrode plate, which are concentrically disposed. The outer diameter of the outer electrode plate is formed to a value larger than the outer diameter of the sample. Furthermore, the overlap surface area of the outer electrode plate and sample, and the surface area of the inner electrode plate are formed so as to have approximately equal size. Then, an optional voltage with a positive polarity relative to the reference voltage is applied to the inner electrode plate, and an optional voltage with a negative polarity relative to the reference voltage is applied to the outer electrode plate.