发明名称 |
NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY |
摘要 |
A nanoimprint mold includes a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. A method for making the nanoimprint mold is also provided.
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申请公布号 |
US2010308512(A1) |
申请公布日期 |
2010.12.09 |
申请号 |
US20100712178 |
申请日期 |
2010.02.24 |
申请人 |
TSINGHUA UNIVERSITY;HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
ZHU ZHEN-DONG;LI QUN-QING;ZHANG LI-HUI;CHEN MO |
分类号 |
B29C43/52;B29C33/42 |
主分类号 |
B29C43/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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