发明名称 NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY
摘要 A nanoimprint mold includes a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. A method for making the nanoimprint mold is also provided.
申请公布号 US2010308512(A1) 申请公布日期 2010.12.09
申请号 US20100712178 申请日期 2010.02.24
申请人 TSINGHUA UNIVERSITY;HON HAI PRECISION INDUSTRY CO., LTD. 发明人 ZHU ZHEN-DONG;LI QUN-QING;ZHANG LI-HUI;CHEN MO
分类号 B29C43/52;B29C33/42 主分类号 B29C43/52
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