发明名称 RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING SPACER, SPACER, METHOD FOR FORMING SPACER, AND LIQUID CRYSTAL DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition for forming a spacer, which has high sensitivity and exhibits excellent adhesion after forming the spacer, to provide the spacer excellent in adhesion with a substrate and a method for producing the spacer, and to provide a liquid crystal display element equipped with the spacer. <P>SOLUTION: The radiation-sensitive resin composition for forming a spacer includes (A) a resin having an acidic group, (B) a polymerizable unsaturated compound, and (C) an oxime ester compound represented by general formula (1), wherein, R and B each independently represent a monovalent substituent; A represents a divalent organic group; and Ar represents an aryl group. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010282180(A) 申请公布日期 2010.12.16
申请号 JP20100096375 申请日期 2010.04.19
申请人 FUJIFILM CORP 发明人 KASHIWAGI DAISUKE;YAMAZAKI KENTA;TSUCHIMURA TOMOTAKA;ANDO TAKESHI
分类号 G02F1/1339;C08F2/44;C08F220/26;G03F7/029;G03F7/031;G03F7/032;G03F7/033;G03F7/038;G03F7/40 主分类号 G02F1/1339
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