发明名称 METHOD FOR MANUFACTURING SILICON INGOT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a polycrystalline silicon ingot capable of effectively utilizing a crucible residue which has become a waste material conventionally and obtaining properties equivalent to the case where a raw material of high purity is used. <P>SOLUTION: The method for manufacturing a silicon ingot is characterized by including a process for pulling up a single crystal ingot for solar cells by a Czochralski method from silicon melt containing a first dopant which specifies a first conductivity, and a process for forming an ingot using a residue in a crucible after pulling up the single crystal silicon ingot (crucible residue) as a raw material of the polycrystalline silicon ingot. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011046564(A) 申请公布日期 2011.03.10
申请号 JP20090196976 申请日期 2009.08.27
申请人 SHARP CORP 发明人 OTAKE YASUTOSHI;OKAMOTO SATOSHI
分类号 C30B29/06;C01B33/02;H01L31/04 主分类号 C30B29/06
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