发明名称 |
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS |
摘要 |
PURPOSE: A lithography device and a method for operating the same are provided to eliminate contaminants in the lithography device by feeding emulsified cleaning liquid to the lithography device. CONSTITUTION: A mixer(300) mixes additive fluid and immersed liquid in order to form emulsified cleaning liquid. A sensor system detects the physical property of the emulsified cleaning liquid. A controller(200) is in connection with the mixer and the sensor system. The controller controls the physical property of the emulsified cleaning liquid and provides the additive fluid to the mixer. |
申请公布号 |
KR20110036688(A) |
申请公布日期 |
2011.04.08 |
申请号 |
KR20100096052 |
申请日期 |
2010.10.01 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOEKERD KORNELIS TIJMEN;DE GRAAF ROELOF FREDERIK;JANSEN HANS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;VAN DER NET ANTONIUS JOHANNUS;KRAMER PIETER JACOB;KUIJPER ANTHONIE;MARTENS ARJAN HUBRECHT JOSEF ANNA;VAN DER GRAAF SANDRA;PADIY ALEXANDRE VIKTOROVYCH |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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