发明名称 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
摘要 PURPOSE: A lithography device and a method for operating the same are provided to eliminate contaminants in the lithography device by feeding emulsified cleaning liquid to the lithography device. CONSTITUTION: A mixer(300) mixes additive fluid and immersed liquid in order to form emulsified cleaning liquid. A sensor system detects the physical property of the emulsified cleaning liquid. A controller(200) is in connection with the mixer and the sensor system. The controller controls the physical property of the emulsified cleaning liquid and provides the additive fluid to the mixer.
申请公布号 KR20110036688(A) 申请公布日期 2011.04.08
申请号 KR20100096052 申请日期 2010.10.01
申请人 ASML NETHERLANDS B.V. 发明人 HOEKERD KORNELIS TIJMEN;DE GRAAF ROELOF FREDERIK;JANSEN HANS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;VAN DER NET ANTONIUS JOHANNUS;KRAMER PIETER JACOB;KUIJPER ANTHONIE;MARTENS ARJAN HUBRECHT JOSEF ANNA;VAN DER GRAAF SANDRA;PADIY ALEXANDRE VIKTOROVYCH
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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