| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment device which can be simplified structurally by enabling a dissolved oxygen concentration and a pH value of a froth layer to be sustained at values of a specified range even at the sacrifice of significantly reducing the number of gas risers of the device. <P>SOLUTION: This exhaust gas treatment device includes a tightly closed tank 21. In addition, the tightly closed tank 21 is compartmentalized into an upper-stage and a lower-stage space by a partition 22. The lower side below the partition 22 serves as an absorbing solution reservoir part 24, and the upper side above the partition 22 serves as an exhaust gas introducing part 26. Besides, the partition 22 is equipped with the gas riser 30 for guiding out an treated exhaust gas from an upper space 24a of the absorbing solution reservoir part 24. Further, in the effective region given as a part, of the partition 22, where the gas riser 30 is not installed, many hanging tubes 29 are installed reaching way into the absorbing solution reserved inside the absorbing solution reservoir part 24. In the effective region, a non-spewing region where the hanging tube 29 is not installed, is arranged. No froth layer is formed in the non-spewing region, and the absorbing solution can be circulated by allowing an expanded absorbing solution to flow down from the froth layer around the non-spewing region. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
