| 发明名称 |
PHOTOCURABLE LOW SHRINKAGE MONOMER COMPOUND |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a (meth)acrylic monomer compound reduced in volumetric shrinkage occurring in photo-curing. <P>SOLUTION: The (meth)acrylic monomer compound includes at least one amide methylol structural moiety consisting of -CO-NH-CH<SB>2</SB>-O- in the molecule. In particular, a 5-99C monomer compound is preferable. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
| 申请公布号 |
JP2011094089(A) |
申请公布日期 |
2011.05.12 |
| 申请号 |
JP20090252210 |
申请日期 |
2009.11.02 |
| 申请人 |
OSAKA ORGANIC CHEM IND LTD |
发明人 |
MATSUOKA KAZUYOSHI;YOSHIOKA NAHO;AKAISHI RYOICHI |
| 分类号 |
C08F20/58;C08F20/36 |
主分类号 |
C08F20/58 |
| 代理机构 |
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