| 摘要 |
PROBLEM TO BE SOLVED: To provide a nano imprint type pattern forming method which suppresses generation of defects. SOLUTION: The pattern forming method includes: a measurement process (a step S110) for measuring wettability of a surface of a template 10 having projections and recesses 12 on a transfer surface 10a; and a determination process (a step S115) for determining whether to transfer the projection and recess pattern on a transfer material 30 or not by contacting the transfer surface of the template on the transfer material 30 arranged on a main surface 20a of the substrate 20, based on a measurement result of wettability. COPYRIGHT: (C)2011,JPO&INPIT
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