| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound for use in a resin for a resist composition, from which a pattern exhibiting excellent resolution and having an excellent shape is obtained. <P>SOLUTION: The compound is represented by formula (I), wherein the ring W<SP>1</SP>represents a 3-36C saturated hydrocarbon ring, the ring W<SP>2</SP>represents a 3-36C saturated hydrocarbon ring, R<SP>1</SP>represents a hydrogen atom or a methyl group, R<SP>2</SP>represents a 1-6C alkyl group, R<SP>3</SP>represents a 1-12C hydrocarbon group, R<SP>4</SP>represents a 1-6C alkyl group, s represents an integer of 1 or 2, t represents an integer of 0-2, and u represents an integer of 0-2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
