发明名称 LASER DOPING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a laser doping method of forming a laser doping concentration profile which steeply varies in a direction parallel to the surface of a substrate at the end of at least a part of a dopant diffusion region. <P>SOLUTION: An irradiation image 91 formed on the surface 12 of the substrate 10 by irradiation with a laser beam 81 includes a first irradiation image region R1 and a second irradiation image region R2 in a first direction parallel to the surface 12. The light intensity density of the laser beam 81 is substantially uniform at first light intensity density P1 in the first irradiation image region R1, and includes second light intensity density P2 which is higher than the first light intensity density P1 and a peak value in the second irradiation image region R2. The light intensity density profile of the laser beam 81 in the second irradiation image region R2 advances toward the second light intensity density P2 with the first light intensity density P1 as a starting point in the direction advancing from the first irradiation image region R1 to the second irradiation image region R2, reaches the peak value at the second light intensity density P2, and decreases thereafter with the peak value as a starting point. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011124476(A) 申请公布日期 2011.06.23
申请号 JP20090282669 申请日期 2009.12.14
申请人 SHARP CORP 发明人 SHIMA HIDEKAZU;TANIGUCHI KIMIHIRO
分类号 H01L21/22;H01L21/225;H01L21/268;H01L31/04;H01S3/00 主分类号 H01L21/22
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