| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a light-emitting element having less light emission unevenness. <P>SOLUTION: The manufacturing method for the light-emitting element 20 includes a process of forming an insulating layer 3, having a through-hole 4 for exposing part of a first semiconductor layer 2a on the first semiconductor layer 2a; a process of forming an light-emitting layer 2b, in contact with the inner wall surface of the through-hole 4 on the first semiconductor layer 2a that is exposed in the through-hole 4; a process of forming a second semiconductor layer 2c having conductivity which is reverse to that of the first semiconductor layer 2a on the light-emitting layer 2b; and a process of heating the light-emitting layer 2b and the second semiconductor layer 2c for reducing the electrical resistance of the second semiconductor layer 2c smaller than the electric resistance of the second semiconductor layer 2c prior to being heated. <P>COPYRIGHT: (C)2011,JPO&INPIT |
