| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate transport apparatus that increases processing ability per apparatus. SOLUTION: A semiconductor workpiece processing apparatus has a first chamber, a transport vehicle, and another chamber. The first chamber is capable of being isolated from an outside atmosphere. The transport vehicle is located in the first chamber and is movably supported from the first chamber for moving linearly relative to the first chamber. The transport vehicle includes a base, and an integral semiconductor workpiece transfer arm movably mounted on the base and capable of multi-access movement relative to the base. The another chamber is communicably connected to the first chamber via a closable opening of the first chamber. The opening is sized to allow the transport vehicle to transit between the first chamber and the another chamber through the opening. COPYRIGHT: (C)2011,JPO&INPIT |
