| 摘要 |
Apparatus for the treatment and growth of an at least partially volatile crystallisable material includes a chamber of the type in which the walls remain fixed relative to each other during the treatment and growth of the material, means for establishing a liquid seal sensitive to a pressure difference across the walls of the chamber and means responsive to the liquid seal for limiting the pressure difference across the walls of the chamber to achieve a pressure balance. The apparatus may be used, for example, for vertical crystal pulling or horizontal zone melting. The means responsive to the liquid seal may include a sensor responsive to the position of liquid in the means for establishing a liquid seal, and a control valve responsive to the sensor and under the control of which gas may be admitted to or withdrawn from a further chamber surrounding the first mentioned chamber. |
