发明名称 |
ELECTRON SOURCE, ELECTRON GUN, ELECTRON MICROSCOPE DEVICE USING THE SAME, AND ELECTRON BEAM LITHOGRAPHY DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron source which can reduce a work function of an electron emission surface rather than a currently-used Zr/O/W electron source and can attain emitted electrons with narrow energy width and high current density and has longer lifetime, an electron microscope which can attain high resolution image for a short period, and an electron beam lithography device having high throughput. <P>SOLUTION: In the electron source provided with a needle electrode 104 made of a metal wherein a pointed head is made at a needle-shape, and a heating element 103 for heating the needle electrode, the electron source has a diffusion source which can be heated with the heating element 103, and the a mixture of a barium compound containing oxygen and carbon particles is set up to be a diffusion source 106. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
申请公布号 |
JP2011159602(A) |
申请公布日期 |
2011.08.18 |
申请号 |
JP20100022655 |
申请日期 |
2010.02.04 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
FUJIEDA TADASHI;OKAI MAKOTO;OSHIMA SUGURU;CHO FUKURAI |
分类号 |
H01J1/304;H01J1/30;H01J37/06;H01J37/073;H01L21/027 |
主分类号 |
H01J1/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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