| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical illumination device and a projection exposure device which decrease light loss when a mask is illuminated with emitted light in a prescribed polarization state.SOLUTION: The projection exposure device includes an optical illumination system (ILS) and an optical projection system (PL). The optical illumination system illuminates a reticle (R) with the illumination light (IL). The projection optical system projects the pattern image of the reticle (R) onto a wafer (W). In the optical illumination system (ILS), the illumination light (IL) emitted from an exposure light source (1) in a line polarization state passes through first and second birefringence elements (12, 13) which have different directions of phase advanced axes, and in a substantially specified annular region, the emitted illumination light (IL) is converted into a substantially line polarization state in a circumferential direction with the optical axis as the center, then the emitted illumination light IL passes through a fly-eyes lens (14) etc. and illuminates the reticle (R) in annular illumination condition. |
