| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for obtaining a pattern with high sensitivity, and to provide a display device or the like using the composition.SOLUTION: The photosensitive resin composition contains a resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C), a solvent (D) and a compound represented by formula (1). The resin (A) is a copolymer formed by polymerizing a monomer having a cyclic ether having 2 to 4 carbon atoms and at least one compound selected from a group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride. |
