| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology for achieving highly accurate pattern drawing based on a relative position of a drawing position of a drawing unit and a substrate.SOLUTION: In a pattern drawing device, a movement position detector 70 for detecting position information in a main scanning direction of a base plate 24 and a passage detector 40 for detecting passage of the base plate 24 moving in a main scanning direction through a prescribed position are provided. A correction amount for correcting a delay of the position information detected by the moving position detector 70 is calculated from passage position information detected by the passage detector 40 and measured position information detected by the moving position detector 70 when passage of the base plate 24 through a prescribed position is detected by the passage detector 40, corrected position information of the base plate 24 is calculated from the correction amount and the measured position information and operation of the drawing timing of a drawing unit 30 is controlled based on the corrected position information. Thus, a pattern can be highly accurately drawn. |
