发明名称 |
PLATING EQUIPMENT, PLATING METHOD AND METHOD FOR MANUFACTURING CHIP TYPE ELECTRONIC COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide plating equipment and a plating method which provide a plating film with high-quality and uniform film thickness, have improved plating efficiency, and achieve energy saving, and to provide a method for manufacturing a chip type electronic component.SOLUTION: The plating equipment has: a carrier plate 22 having a storage section 24 to store an element body 10; a conveyor belt 30 which moves together with the carrier plate 22; a plating solution impregnating roller 40 which supplies a plating solution to the storage section 24 during movement of the carrier plate 22; and an anode electrode and a cathode electrode indirectly or directly connected with portions planned to be plated of the element body 10 in a state in which the plating solution is supplied to the storage section 24. |
申请公布号 |
JP2011208203(A) |
申请公布日期 |
2011.10.20 |
申请号 |
JP20100075949 |
申请日期 |
2010.03.29 |
申请人 |
TDK CORP |
发明人 |
WATANABE HIDETOSHI;SAKANO TETSUSHI |
分类号 |
C25D17/14;C25D7/00;C25D7/06 |
主分类号 |
C25D17/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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