发明名称 NONVOLATILE MEMORY AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a nonvolatile memory in which setting operation and resetting operation can be ensured in bipolar driving, and to provide a manufacturing method of the same. <P>SOLUTION: The nonvolatile memory comprises: a word line WL as a first electrode; a bit line BL as a second electrode; a resistance change portion 25 which is provided between the word line WL and the bit line BL and transits between a first resistance state and a second resistance state; and a selection element 22 which is provided between the resistance change portion 25 and the word line WL, comprises a p layer 22p including a p-type semiconductor, an i-layer 22i including an intrinsic semiconductor, and an n layer 22n including n-type semiconductor, and comprises an impurity 220 which has smaller band gap energy than that of the intrinsic semiconductor and in which the concentration peak of the i layer 22i is at the center of the layer thickness of the i layer 22i. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011222929(A) 申请公布日期 2011.11.04
申请号 JP20100137167 申请日期 2010.06.16
申请人 TOSHIBA CORP 发明人 IWAKAJI YOKO;HIROTA JUN;YABUKI SO
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
代理机构 代理人
主权项
地址