| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a target device capable of enhancing the productivity of the film deposition on a substrate. <P>SOLUTION: The film deposition apparatus 1 has a target 25 being a film deposition material and a plate-like cooling plate 22 which is brought into contact with the target 25 and cooled. The target 25 and the cooling plate 22 are clamped by a clamp 27. In the cooling plate 22, a second face 22b on the opposite side of a first face 22a opposite to the target 25 is exposed to a higher-pressure atmosphere than the first face 22a is, and a center part 22c in the first face 22b is displaced to the target 25 side to press the target 25. <P>COPYRIGHT: (C)2012,JPO&INPIT |
