| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that blocks light so that the light is not incident to an outer peripheral region of a substrate. <P>SOLUTION: A lithographic apparatus, which transfers a pattern of an original plate to a shot region of a substrate by irradiating light from an irradiating system to a photosensitive material applied onto the substrate through the original plate, includes: a light blocking plate 9 that regulates a region of the substrate, in which the pattern is to be transferred, includes a circular arc, which overlaps a circular boundary line displaced inwardly by a predetermined width from an outer periphery of the substrate, at its edge, and blocks light so that the light is not incident to an outer peripheral region that is outside the circular boundary line on the substrate; a first driving unit 95 that rotationally drives the light blocking plate around an axis parallel to an optical axis of the irradiating system; a second driving unit 96 that linearly drives the light blocking plate in a plane vertical to the optical axis of the irradiating system; and a controlling unit that, when the shot region, in which the pattern should be transferred, contacts the outer peripheral region, controls the first driving unit and the second driving unit so that the light blocking plate is positioned to cover the outer peripheral region contacting the shot region. <P>COPYRIGHT: (C)2012,JPO&INPIT |
