发明名称 SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR ELEMENT STRUCTURE HAVING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor element that can naturally implement a cut-off state of a transistor and increase driving current by selecting the Fermi level of a source region so that the Schottky barrier can be substantially reduced with suppressing the generation of a depletion layer in the neighborhood of the interface with a metal region in a semiconductor region, and a semiconductor element structure having the semiconductor element. <P>SOLUTION: A source region 6 and a drain region 7 have a first metal region 10 and a second metal region 11 which are different in Fermi level. The first metal region 10 is formed of metal having a Fermi level ranging from the energy level at the top of a valence band of a semiconductor region 5 to the intrinsic Fermi level of the semiconductor region 5. The second metal region 11 is formed of metal having a Fermi level ranging from the Fermi level of the first metal region 10 to the energy level at the bottom of a conduction band. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011249561(A) 申请公布日期 2011.12.08
申请号 JP20100121267 申请日期 2010.05.27
申请人 KANSAI UNIV 发明人 OMURA YASUHISA
分类号 H01L29/78;H01L21/28;H01L21/331;H01L29/417;H01L29/732;H01L29/861 主分类号 H01L29/78
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