| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position determination technique of exposure equipment, in which, when a pattern of a reticle is projected onto a substrate, a position of the substrate in a direction along an optical axis is determined. <P>SOLUTION: Exposure equipment including a projection optical system for projecting a pattern of a reticle 30 onto a substrate 60 comprises: a stage 70 for driving the substrate; an acquiring unit 100 for, when a first pattern of which longitudinal direction is a first direction perpendicular to an optical axis of the projection optical system and a second pattern of which longitudinal direction is a second direction perpendicular to an optical axis of the projection optical system and not in parallel with the first direction are disposed on an object surface of the projection optical system, acquiring a first imaging position on which the first pattern is imaged and a second imaging position on which the second pattern is imaged; and a control unit 110 for determining a position of the substrate in a direction along the optical axis when the pattern of the reticle is projected onto the substrate, and controlling the drive of the substrate by the stage so that the substrate is positioned to the determined position. <P>COPYRIGHT: (C)2012,JPO&INPIT |
