发明名称 n-TYPE DIFFUSION LAYER FORMING COMPOSITION, METHOD FOR MANUFACTURING n-TYPE DIFFUSION LAYER, AND METHOD FOR MANUFACTURING SOLAR CELL
摘要 <P>PROBLEM TO BE SOLVED: To provide an n-type diffusion layer forming composition excellent in dispersion stability, capable of forming an n-type diffusion layer at a specific portion without forming an unnecessary n-type diffusion layer, in a manufacturing process of a solar cell using a crystalline silicon substrate; a method for manufacturing an n-type diffusion layer; and a method for manufacturing a solar cell. <P>SOLUTION: An n-type diffusion layer forming composition includes glass powder containing a donor element; a binder having a weight average molecular weight of 5,000 or more and 500,000 or less; and a solvent. An n-type diffusion layer and a solar cell having an n-type diffusion layer are manufactured by applying the n-type diffusion layer forming composition and subjecting the n-type diffusion layer forming composition to heat diffusion treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012019052(A) 申请公布日期 2012.01.26
申请号 JP20100155174 申请日期 2010.07.07
申请人 HITACHI CHEM CO LTD 发明人 ADACHI SHUICHIRO;YOSHIDA MASATO;NOJIRI TAKESHI;OKANIWA KAORU;MACHII YOICHI;IWAMURO MITSUNORI;SATO TETSUYA;KIZAWA KEIKO
分类号 H01L21/225;H01L31/04 主分类号 H01L21/225
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