发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR VERTICAL MAGNETIC RECORDING MEDIUM AND SUBSTRATE FOR VERTICAL MAGNETIC RECORDING MEDIUM MANUFACTURED BY THE SAME METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for reducing the undulation of full wavelength components, and to provide a medium for improving the floating travel stability of a magnetic head by reducing the contact of the magnetic head. <P>SOLUTION: The manufacturing method includes: a first polishing step of, while supplying first slurry liquid containing organic acid or inorganic acid and first polishing materials to the base layer of a substrate having a base layer consisting of Ni-P system alloy, polishing the substrate by using first porous materials containing polishing materials selected from a group consisting of alumina, titania, silica, and zirconia with density ranging from 0.1 to 25 wt%; and a second polishing step of polishing the surface of the base layer processed by the first polishing step with second porous materials while supplying second slurry liquid containing organic acid or inorganic acid and second polishing materials whose particle diameters are smaller than those of the first polishing materials. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012018707(A) 申请公布日期 2012.01.26
申请号 JP20100154078 申请日期 2010.07.06
申请人 FUJI ELECTRIC CO LTD 发明人 SAKAGUCHI SHOJI;MIYAKOSHI KIMITAKA;NATSUME JUN
分类号 G11B5/84;G11B5/73 主分类号 G11B5/84
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