DEVELOPING SOLUTION FOR PHOTORESIST, AND DEVELOPING DEVICE

摘要

PROBLEM TO BE SOLVED: To develop a resist film on a substrate with high accuracy and to improve dimensional accuracy of a resist pattern formed in the resist film.

SOLUTION: A developing solution nozzle 133 of a developing device 30 is connected to a developing solution supply block 136 supplying a developing solution to the developing solution nozzle 133. The developing solution supply block 136 includes a developing undiluted solution supply source 150 reserving a developing undiluted solution inside, an organic solvent supply source 160 reserving an organic solvent inside, and a developing solution supply source 170 mixing the developing undiluted solution with the organic solvent to produce the developing solution. A solvent which is soluble with the developing undiluted solution and does not neutralize the developing undiluted solution is used for the organic solvent. The developing solution is produced by mixing the developing undiluted solution with the organic solvent to control the concentration of the organic solution with respect to the developing undiluted solution to 5 mass% or lower.

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