| 摘要 |
<P>PROBLEM TO BE SOLVED: To control formation of defects of a substrate surface detected by a high sensitive defect inspection device, and to improve the manufacturing yield, in the manufacture of synthetic quartz glass for a synthetic quartz glass substrate or the like used for an optical lithography method important for a photomask, nano imprint, a magnetic disk, etc., and to contribute to further high definition in the semiconductor industry. <P>SOLUTION: There is provided a synthetic quartz glass substrate abrasive containing a collagen derivative and a colloidal solution. The collagen derivative has glycine and hydroxyproline in its structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
