发明名称 |
THERMOSETTING RESIN COMPOSITION, AND CURED FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thermosetting resin composition which can inhibit that a crack generates in the thermosetting resin composition at the time of grinding, and further can make a relative dielectric constant after thermosetting low in the thermosetting resin composition which is prepared so as to cover a bump electrode of a semiconductor wafer having the bump electrode at the back surface, and is used in order to expose the bump electrode by carrying out grinding after performing the heat curing treatment. <P>SOLUTION: The thermosetting resin composition includes: a cyclic olefin resin of acid curability (A); and an acid generator (B) which generates acid with light or heat. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012025814(A) |
申请公布日期 |
2012.02.09 |
申请号 |
JP20100163869 |
申请日期 |
2010.07.21 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
OHASHI SEIJI;TAKEUCHI ETSU |
分类号 |
C08G59/02;C08K5/5419;C08L63/00;H01L23/29;H01L23/31 |
主分类号 |
C08G59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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