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发明名称
净化半导体制程废气之合氧供热装置
摘要
本创作提供一种净化半导体制程废气之合氧供热装置,包括罩设于处理槽顶部的头座,头座上设有废气导管与热管,该废气导管延伸至该处理槽内形成一朝下的废气排放口,该热管植入该处理槽内形成一沿该废气排放口方向延伸形成的管部,且该管部一端形成一热空气排放口,该热空气排放口系低于该废气排放口一特定距离,藉以供应热空气进入处理槽内,并增加废气与该热管产生之热源的接触时间,以净化废气中的有害物质。
申请公布号
TWM423583
申请公布日期
2012.03.01
申请号
TW100218744
申请日期
2011.10.06
申请人
东服企业股份有限公司
发明人
冯五裕
分类号
B01D53/74
主分类号
B01D53/74
代理机构
代理人
沈维扬 台北市信义区基隆路2段91号3楼之1
主权项
地址
台北市中山区中山北路1段72号11楼之6 TW RM. 6, 11TH FL., 72, CHUNG SHAN N. RD., SEC. 1, TAIPEI, TAIWAN, (R. O. C.)
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