发明名称 |
STAGE DEVICE, LITHOGRAPHIC APPARATUS, AND POSITIONING METHOD FOR OBJECT TABLE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stage device including a measurement system of high accuracy. <P>SOLUTION: A measurement system configured to measure a position dependent signal of an object table comprises: at least one sensor attachable on the object table; an sensor target object attachable on a substantially stationary frame. The measurement system is an attachment device configured to attach the sensor target object on the substantially stationary frame. The measurement system also comprises a compensator to compensate movement and/or modification of the sensor target object in relation to the substantially stationary frame. The compensator can comprises a passive or active damper and/or a feedback position controller. In an alternative embodiment, the compensator comprises a gripping device to fix the position of the sensor target object while an movable object is moved with high accuracy. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012049532(A) |
申请公布日期 |
2012.03.08 |
申请号 |
JP20110178719 |
申请日期 |
2011.08.18 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;EUSSEN EMIEL JOZEF MELANIE;JEUNINK ANDRE BERNARDUS;ROBBERT EDGAR VAN LEEUWEN |
分类号 |
H01L21/027;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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