| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blank inspection device for a multilayer film mask blank using EUV light as inspection light, capable of accurately positioning the position of a plasma light source in a short time. <P>SOLUTION: A position of a mask stage 7 for capturing EUV light is previously stored by using a photo diode 24 for EUV light detection, and a first intensity distribution of the EUV light at the position is measured. After re-installing a light source 6, a second intensity distribution of the EUV light at the position of the mask stage 7 for capturing the EUV light is measured as a function of the position coordinate of the photo diode 24 for EUV light detection, The light source 6 is moved by a light source fine movement mechanism 23 so that the first intensity distribution coincides with the second intensity distribution. Further, a scatterer 25 is irradiated with the EUV light and a third intensity distribution of the scattered EUV light is detected by a two-dimensional array sensor SE, and then the light source 6 is moved by the light source fine movement mechanism 23 according to the third intensity distribution. <P>COPYRIGHT: (C)2012,JPO&INPIT |
