发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To improve drawing accuracy by effectively suppressing stretching of a pattern drawn on a substrate in a scanning direction, without performing complicated processing to correct CAD data of the pattern. <P>SOLUTION: A drawing control section (71) provides driving circuits (27) of a light beam radiating device with drawing data of a scanning range which is shorter than the length in the scanning direction of a pattern to be drawn in the scanning area. An operation circuit (85) determines from coordinate data memorized in a memory (82) a position to start radiation of a light beam to a substrate and a position to end the radiation. A correction circuit (87a) corrects the light beam radiation ending position determined by the operation circuit, to shorten the scanning range. A drawing data generation circuit (86) generates drawing data between the light beam radiation starting position determined by the operation circuit and the light beam radiation ending position corrected by the correction circuit. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012053296(A) 申请公布日期 2012.03.15
申请号 JP20100196055 申请日期 2010.09.01
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MOCHIZUKI MASAAKI
分类号 G03F7/20;G02F1/1335;G02F1/1368;H01L21/027 主分类号 G03F7/20
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