| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an advantageous technique for determining a light intensity distribution to be formed on a pupil plane of an illumination optical system. <P>SOLUTION: In an exposure device, a method comprises a step S102 of setting a mask pattern disposed on an object surface of a projection optical system, a step S104 of setting a cut line for estimating an optical image of the mask pattern on the image surface of the projection optical system, a step S108 of generating plural element light sources formed on a pupil plane of the illumination optical system so as to be different from each other, a step S110 of calculating an optical image of the mask pattern formed on the cut line set in the second step when the mask pattern is illuminated by each of the plural element light sources, and a step S112 of determining a weight to be applied to each of the plural element light sources so that the dimension on the cut line of the optical image of the mask pattern is made to approach to a target value, and determining a light source achieved by combining the plural weighted element light sources as a light intensity distribution to be formed on the pupil plane of the illumination optical system. <P>COPYRIGHT: (C)2012,JPO&INPIT |
