| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a CMP liquid which can suppress generation of polishing scratches while suppressing decrease of a polishing rate. <P>SOLUTION: The method of manufacturing a CMP liquid includes a filtering process which filters a dispersing liquid containing cerium oxide particles, a dispersant and water, with a filtration rate less than 75 L/(min x m<SP POS="POST">2</SP>). <P>COPYRIGHT: (C)2012,JPO&INPIT |
