| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device advantageous for controlling both distortion aberration and astigmatism of a projection optical system to be within a target range. <P>SOLUTION: The exposure device has a projection optical system for projecting a pattern of an original plate onto a substrate and exposes the substrate. The projection optical system includes a first parallel flat plate at a front side of a pupil thereof and a second parallel flat plate at a rear side of the pupil. Two shapes, which are obtained by bending points on the first parallel flat plate and the second parallel flat plate corresponding to each other so that each of the points moves to the same direction, are defined as a first shape and a second shape. And two shapes, which are obtained by bending points on the first parallel flat plate and the second parallel flat plate corresponding to each other so that each of the points moves to an opposite direction, are defined as a third shape and a fourth shape. Then, the distortion aberration and the astigmatism of the projection optical system are adjusted by deforming the first parallel flat plate so as to become a fifth shape obtained by synthesizing the first shape and the third shape, and by deforming the second parallel flat plate so as to become a sixth shape obtained by synthesizing the second shape and the fourth shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |
