| 摘要 |
PURPOSE: A novolac phenolic resin and a resin composition for photoresist containing the same are provided to improve the heat resistance characteristic, the sensitivity, and the residual film rate of the resin. CONSTITUTION: A novolac phenolic resin is obtained from the reaction of phenols, dihydroxybenzene or the derivative of the same, and formaldehyde under an acid catalyst. The phenols contains 50-90 weight% of metacresol and 10-50 weight% of paracresol. The weight average molecular weight of polystyrene conversion by gel permeation chromatography with respect to the novolac phenolic resin is between 15000 and 45000. The dihydroxybenzene or the derivative of the same is one or more selected from resorcinol, catechol, and hydroquinone. The weight ratio of the dihydroxybenzene or the derivative of the same with respect to the phenols is between 1 and 10 weight%. The molar ratio of the formaldehyde with respect to the phenols is between 0.4 and 1.0.
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