发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To allow a user to easily replace only a surface portion when the surface of a stage of a plasma processing apparatus is damaged. <P>SOLUTION: A stage 20 is divided into a stage body 21 and a surface plate 22 above the stage body 21. A pair of rails 61 used to move a processing head 10 are arranged on both sides across the stage 20. A stage maintenance crane 30 is provided on the rails 61. Sliders 34 are respectively provided at lower ends of a pair of support parts 32 of a frame 31 of the crane 30, and the sliders 34 are slidably fitted with the respective rails 61. A suspension tool 51 is suspended from a ceiling part 33 of the frame 31 in a manner capable of being lifted/lowered, and a coupling part 52 is provided on the suspension tool 51. Preferably, the coupling part 52 is coupled to an end face of the surface plate 22 via a bolt 55. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012069470(A) 申请公布日期 2012.04.05
申请号 JP20100215221 申请日期 2010.09.27
申请人 SEKISUI CHEM CO LTD 发明人 MIYAZATO KENICHIRO;SAITO NAOMICHI;NAKANO YOSHINORI
分类号 H05H1/24;B08B7/00;C23C16/44;C23C16/455;C23C16/458;H01L21/304;H01L21/3065;H01L21/683 主分类号 H05H1/24
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