发明名称 IMAGING APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide an imaging apparatus advantageous to miniaturization, and also to provide a manufacturing method thereof. <P>SOLUTION: An imaging apparatus of the embodiment includes: a semiconductor substrate 11 with multiple pixels 6 arranged thereon; a transparent substrate 17 including first through electrodes 23 arranged in previously penetrated openings (17a, 17b); second through electrodes 22 exposed on the pixels and connected to the first through electrodes 23; an adhesive material 16 for performing adhesion between the semiconductor substrate 11 and the transparent substrate 17; and an imaging lens part 26 arranged on the transparent substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012070102(A) 申请公布日期 2012.04.05
申请号 JP20100211431 申请日期 2010.09.21
申请人 TOSHIBA CORP 发明人 KAWASAKI ATSUKO;HAGIWARA KENICHIRO;SEKINE KOICHI
分类号 H04N5/225;G02B7/02;H04N5/232 主分类号 H04N5/225
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