发明名称 Surface-emission laser diode and fabrication process thereof
摘要 A surface-emission laser diode comprises a cavity region over a semiconductor substrate and includes an active layer containing at least one quantum well active layer producing a laser light and a barrier layer, a spacer layer is provided in the vicinity of the active layer and formed of at least one material, an upper and lower reflectors are provided at a top part and a bottom part of the cavity region, the cavity region and the upper and lower reflectors form a mesa structure over the semiconductor substrate, the upper and lower reflectors being formed of a semiconductor distributed Bragg reflector having a periodic change of refractive index and reflecting incident light by interference of optical waves, at least a part of the semiconductor distributed Bragg reflector is formed of a layer of small refractive index of AlxGa1-xAs (0<x≰1) and a layer of large refractive index of AlyGa1-yAs (0≰y<x≰1), the lower reflector is formed of a first lower reflector having a low-refractive index layer of AlAs and a second lower reflector formed on the first lower reflector, the second lower reflector has a low-refractive index layer of AlGaAs, any one layer constituting the cavity region contains In.
申请公布号 US8199788(B2) 申请公布日期 2012.06.12
申请号 US20100691476 申请日期 2010.01.21
申请人 SATO SHUNICHI;ITOH AKIHIRO;JIKUTANI NAOTO;RICOH COMPANY, LTD. 发明人 SATO SHUNICHI;ITOH AKIHIRO;JIKUTANI NAOTO
分类号 H01S5/00;H01S5/042;H01S5/183;H01S5/22;H01S5/42 主分类号 H01S5/00
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