| 发明名称 |
LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality. <P>SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012114484(A) |
申请公布日期 |
2012.06.14 |
| 申请号 |
JP20120066780 |
申请日期 |
2012.03.23 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
JOERI LOF;BUTLER HANS;DONDERS SJOERD NICOLAAS LAMBERTUS;ALEXEI KOLESNE TCHENKO;LOOPSTRA ERIK ROELOF;MEIJER HENDRICUS JOHANNES MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;VAN SCHAIK FRANK;SENGERS TIMOTHEUS FRANCISCUS;KLAUS SIMON;DE SMIT JOANNES THEODOOR;ALEXANDER STOLE YALE;STREEFKERK BOB;ERIK THEODORUS MARIA BIJLAART;CHRISTIAAN ALEXANDER HOOGENDAM;HELMAR VAN SANTEN;VAN DE KERKHOF MARCUS ADRIANUS;KROON MARK;DEN BOEF ARIE JEFFREY;OTTENS JOOST JEROEN;JEROEN JOHANNES SOPHIA MARIA MERTENS |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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