LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus which suppresses outflow of liquid to outside a substrate even when abnormality such as power failure occurs.

SOLUTION: An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and liquid while filling a gap between the projection optical system and the substrate by the liquid. The exposure apparatus comprises: a liquid recovery mechanism having a driving section driven by electric power supplied from a commercial power source; and an uninterruptible power source other than the commercial power source. When the commercial power source fails, electric power supply to the driving section is switched to the uninterruptible power source.

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