METHOD OF FORMING METAL OXIDE HARDMASK

摘要

PURPOSE: A method for forming a metal oxide hard mask on a template is provided to control the collapse of a pattern by minimizing the difference of film stress between a spacer film and core material. CONSTITUTION: A photo-resist(41) is formed on a base film(42). A spacer film(43) covers the photo-resist and the base film. A spacer is formed on a sidewall of the photo-resist. An inner wall(43b) of the spacer does not have an overhang portion at the top edge. The distance between top edges is similar to the distance between vertical portions of the spacer. A pattern transfer layer(44) is formed on a substrate(45). The pattern transfer layer is etched in a vertical direction.